May include a first halo arranged around a semiconductor workpiece,Īnd a mounting assembly coupling the first halo to a roplat.
Reducing an amount of sputtered material to minimize particleĭefects impacting a workpiece. TRANSPARENT HALO ASSEMBLY FOR REDUCED PARTICLE GENERATIONĮmbodiments herein include a transparent halo assembly for Allen, Costel Biloiu, Daniel McGillicuddy. The applicant listed for this patent is Varian Semiconductor Equipment Associates, Inc. This patent application is currently assigned to Varian Semiconductor Equipment Associates, Inc. patent application number 15/803259 was filed with the patent office on for transparent halo assembly for reduced particle generation.
0 kommentar(er)
